Plasma chemical etching for c-Si photovoltaics
    Structuring of TCO layers for TF-Photovoltaics
    Infection control – Process and materials studies
    Application demonstrator for infection control
    Energy storage – Process and materials R&D
    Application demonstrator for energy storage
    Interface technologies for durable adhesion
    Application demonstrator for interface technologies
    Cross-cutting equipment development

Cross-cutting equipment development

Scalable plasma source for atmospheric pressure plasma operation

Reactor for continuous high throughput plasma-chemical etching and coating

Generic development and engineering of high-spec equipment for industrial production of 3D nano-structured surfaces

• scalable plasma sources for atmospheric pressure plasma operation
• tailored industrial scale power supplies for these new plasma sources
• reactors for continuous high throughput plasma-chemical etching and coating
• fluid dynamic modelling for equipment design
• equipment and procedures for both process monitoring and quality assurance

Equipment and procedures for both process monitoring and quality assurance

Plasma sources

• linearly extended DC arc
• microwave discharge
• dielectric barrier discharge (DBD)

Adapted power supplies

• AF transformer based pulse system
• nanosecond scale short pulse HV generator for DBD
• DC power supply for linear arc

On-line process characterisation and control

• optimized laser diode spectroscopy in the NIR/MIR region
• FTIR spectroscopy

Coating and etching heads

• for silicon solar wafers
• etching and deposition of TCO
• deposition of biocidal film
• growth of aligned carbon nano-tubes
• for interface control