Archive 2010
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Review of N2P trade fair participations and events in 2009 |
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March 25 - 26, 2010
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IWTPV´10 - International Workshop on Teaching Photovoltaics
Prague, Czech Republic
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April 7 - 9, 2010
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CPV-6 - International Conference on Concentrating Photovoltaics
Freiburg, Germany
More information |
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April 12 - 16, 2010
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SP-3 Third International conference on semiconductor photochemistry
Glasgow, UK
"Antimicrobial activity of titania/silver and titania/copper films prepared by CVD",
H.A. Foster, D.W. Sheel , P. Sheel, P. Evans, S. Varghese, M. Rutschke, H.M. Yates, F.J. Bolton
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April 27 - 29, 2010
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PHOTON‘s 6th Photovoltaic Technology Show 2010 Europe
Stuttgart, Germany
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May 5 - 7, 2010
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SOLAREXPO 2010
Verona, Italy
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May 18 - 20, 2010
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General assembly, PCC meeting, WP meetings
Horn, Rorschach, CH
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June 9 - 11, 2010
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Intersolar 2010
Munich, Germany
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June 13 - 18, 2010
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5th Forum on New Materials
Montecatini Terme, Italy
“3-Dimensional nanostructructured ZnO for Higly Efficient Thin Film Silicon Solar Cells”,
Milan Vaněček (invited talk)
"Structure controlled TCOs for Solar Cells using fast growth rate Atmospheric Pressure Chemical Vapour Deposition"
P. Evans, D.W. Sheel, H.M. Yates, U. Dagkaldiran, A. Gordijn, F. Finger, C. Bailiff, S. Fay, S. Nicolay (oral presentation)
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August 8 -13, 2010
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ICCG - The 16th International Conference on Crystal Growth
Beijing, China
"Surface Structure Modification of Tin Oxide for Thin Film Photovoltaic Applications via Dielectric Barrier Discharge Etching",
J.L. Hodgkinson, D.W. Sheel, M.Thomson
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September 6 - 10, 2010
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25th European Photovoltaic Solar Energy Conference and Exhibition EU PVSEC
Feria Valencia in Valencia, Spain
"A New Combinational Approach to Structuring ZnO Surfaces at Atmospheric
Pressure",
D.W. Sheel, J.L. Hodgkinson, M. Thomson
“Tuning the rear side morphology of crystalline silicon solar cells by plasma chemical etching at atmospheric pressure for maximal light trapping effect”,
M. Macháček, J. Šenkýř, V. Malota, M. Chudoba, P. Bařinková, R. Bařinka, P. Čech, E. Lopez, G. Mäder, I. Dani, D. Franta, D. Nečas and A. Poruba
“Multicrystalline silicon etching in fluorine- and chlorine-containing atmospheric pressure plasmas”,
E. Lopez, B. Leupolt, I. Dani, S. Kaskel, E. Beyer
“Plasma etching of SnO2:F films at atmospheric pressure for thin film silicon solar cells”,
E. Lopez, B. Leupolt, I. Dani, S. Kaskel, E. Beyer
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September 13 - 17, 2010
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PSE 2010 - Twelfth International Conference on Plasma Surface Engineering
Garmisch-Partenkirchen, Germany
"Effect of substrate material on surface morphology of thin films prepared by nonreactive magnetron sputtering", Pavel Baroch, Tomas Kozak, Jindrich Musil
“Scalable linear microwave plasma source at atmospheric pressure”, Julius Roch, Ines Dani, Stefan Kaskel, E. Beyer, M. Scharrnbeck, K. Schröter
“Plasma etching of SnO2:F films at atmospheric pressure for silicon thin film solar cells”, E. Lopez, B. Leupolt, I. Dani, S. Kaskel, E. Beyer
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October 17 - 21, 2010
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TCM 2010 - 3rd International Symposium on Transparent Conductive Materials
Analipsi / Hersonissos, Crete, Greece
"Structure controlled TCOs for Solar Cells using fast growth rate Atmospheric Pressure Chemical Vapour Deposition", D.W. Sheel, (invited talk), H.M. Yates, J. Hodgkinson, M. Thomson, P. Evans, C. Bailiff, S. Fay, S. Nicolay, L. Ding
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November 10 - 13, 2010
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5. CFVK - 5th Czech Photovoltaic Conference
Brno, Czech Republic |
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